Method For Producing A Purified Borazine Compound, Method For Filling A Borazine Compound, And Container For Preserving A Borazine Compound

ABSTRACT

On producing a purified borazine compound, a borazine compound is filtrated under an atmospheric condition of a water content of not higher than 2000 volume ppm. Or, on filling a borazine compound into a container, the above described borazine compound is filled into the above described container under an atmospheric condition of a water content of not higher than 2000 volume ppm. Or, as a container for preservation for preserving a borazine compound, a container for preserving a borazine compound, which has withstanding pressure of not lower than 0.1 MPa, is used.

CROSS-REFERENCE TO RELATED APPLICATIONS

This application is a division of U.S. application Ser. No. 11/346,551,filed on Feb. 2, 2006, claiming priority to Japanese Patent ApplicationNo. 2005-241389, filed Aug. 23, 2005; and Japanese Patent ApplicationNo. 2005-250074, filed Aug. 30, 2005, the content of which is herebyincorporated by reference in its entirety.

BACKGROUND OF THE INVENTION

1. Field of the Invention

The present invention relates to borazine compounds. Borazine compoundsare used to form, for example, an interlayer dielectric film forsemiconductor, a barrier metal layer and an etching stopper layer.

2. Description of Related Art

With higher functionalization of information devices, design rule of LSIhas been required to be finer year by year. In production of LSI withfiner design rule, materials composing LSI should also have higherperformance and fulfill function even on fine LSI.

For example, as for materials used for an interlayer dielectric film inLSI, high dielectric constant causes signal delay. In fine LSI, effectsof the signal delay is particularly significant. Therefore, developmentof a new low dielectric material which can be used for an interlayerdielectric film has been needed. Also, it is necessary not only to havelow dielectric constant but also superior characteristics such ashumidity resistance, heat resistance, mechanical strength, etc. to beused as an interlayer dielectric film.

As a material to respond to these requirements, a compound havingborazine ring backbone has been proposed (for example, see US Laid OpenPatent No. 2002-58142). A compound having borazine ring backbone(borazine compound) has small molecular polarizability and thus a coatedfilm formed provides low dielectric constant. Moreover, the coated filmformed is superior in heat resistance.

As a borazine compound, various compounds have been proposed up to now.For example, an alkylborazine compound, whose boron moiety issubstituted with an alkyl group, has very superior characteristics aslow dielectric constant material (for example, see US Laid Open PatentNo. 2003-100175).

BRIEF SUMMARY OF THE INVENTION

Here, when a borazine compound is used, for instance, as an interlayerdielectric film for semiconductor as stated above, it is preferable thatimpurities in a borazine compound used are fewer. For example, in caseof using it as an interlayer dielectric film of a semiconductor, whenimpurities in a borazine compound used are too much, there is fear thatthe function of an interlayer dielectric film, or the like obtained islowered. On the contrary, when impurities in a borazine compound usedare few, occurrence of such problems as stated above can be suppressed.

The present inventors have found that a contaminating source ofimpurities which may cause lowering of the function of an interlayerdielectric film or the like as stated above is, for example, impuritiesin air on production of a borazine compound, filling thereof into acontainer, or conveyance thereof or the like, as a cause thereof. Also,the present inventors have found that contact with moisture of aborazine compound may become a cause of contamination of impurities.Namely, the present inventors have found that when a borazine compound(for example, N,N′,N″-trimethylborazine) contacts with moisture, N—Bbond is hydrolyzed, and a decomposed product (for example, methylamineand a boric acid) generates as impurities.

Conventionally, as for a borazine compound, only a small amount thereofin a laboratory scale was synthesized, and it is usually preserved in areagent bottle, or the like. On the other hand, when mass productionthereof from now is taken into consideration, it is thought thatnecessity of preserving it in a larger container for a long period willbe caused.

Here, on preserving a borazine compound which was mass-produced, a caseof adopting as a container for preservation a drum or the like which isused for preserving a general compound, is considered. Such a containerusually breathes under an atmosphere to the extent of an atmosphericpressure, and a gas in a container and an outer gas comes and goes tosome extent at an inside and an outside of the container. Therefore,when a container used conventionally generally for preserving a compoundis attempted to use for preserving a borazine compound as it is, thereis possibility that moisture contained in an outer gas flows into thecontainer accompanied with flowing into the container of an outer gas,and decomposition of a borazine compound is caused.

As stated above, there is fear that impurities are contaminated intosaid compound in many processes of production of a borazine compound,filling thereof into a container, conveyance or preservation thereof.However, as means for removing effectively such impurities contaminated,satisfactory means have not yet been proposed, and development of suchmeans is waited for, which is the present status.

An object of the present invention is to provide a mean for suppressingeffectively the contamination of impurities into said compound onproduction of a borazine compound and on filling a borazine compoundproduced into a container.

Another object of the present invention is, on preserving a borazinecompound, to provide a mean for suppressing the flowing of an outer gascontaining moisture into a container for preservation and to preventdecomposition of a borazine compound on preservation.

Still another object of the present invention is to provide a borazinecompound having a small content of impurities.

The present inventors have intensively studied to accomplish the objectsdescribed above. As the result, the present inventors have found that onproduction or filling of a borazine compound, contamination ofimpurities in a borazine compound can be suppressed by controlling acontent of moisture in an atmosphere on production or filling of aborazine compound. Further, the present inventors have found thatcontamination of impurities in a borazine compound can be suppressed bycontrolling a withstanding pressure of a container for preservation usedfor preserving a borazine compound to not lower than a predeterminedvalue.

Namely, according to an aspect of the present invention, a method forproducing a purified borazine compound, which has a borazine compoundpreparatory step wherein a borazine compound is prepared, and afiltration step wherein the above described borazine compound preparedis filtrated under an atmospheric condition of a water content of nothigher than 2000 volume ppm, is provided.

According to another aspect of the present invention, a borazinecompound in which a content of impurities having a particle diameter ofnot smaller than 0.5 μm is not higher than 100 particles/mL, isprovided.

According to further another aspect of the present invention, a methodfor filling a borazine compound, which has a filling step wherein aborazine compound is filled into a container under an atmosphericcondition of water content of not higher than 2000 volume ppm, isprovided.

According to further another aspect of the present invention, acontainer for preserving a borazine compound, which has withstandingpressure of not lower than 0.1 MPa, is provided.

According to further another aspect of the present invention, a borazinecompound in which decrease of purity in case of preserving at 25° C. for60 days is not higher than 1% by mass, is provided.

DETAILED DESCRIPTION OF THE INVENTION

One aspect of the present invention relates to a technique forsuppressing contamination of impurities into a borazine compound onproduction of said compound. Specifically, said aspect of the presentinvention is a method for producing a purified borazine compound, whichhas a borazine compound preparatory step wherein a borazine compound isprepared, and a filtration step wherein the above described borazinecompound prepared is filtrated under an atmospheric condition of a watercontent of not higher than 2000 volume ppm.

In a method of production of the present aspect, a borazine compound isfiltrated under an atmospheric condition having specified water content.Thereby, contamination of impurities into a purified borazine compoundcan be suppressed effectively.

Subsequently, a method for production of the present aspect is explainedin detail in the order of processes.

[A Borazine Compound Preparatory Step]

In a method for production of the present aspect, first of all, aborazine compound is prepared.

Specific embodiments of a borazine compound prepared are notparticularly limited, and conventionally known knowledge may be referredappropriately. The borazine compound is represented, for example, by thechemical formula 1 described below.

wherein R¹ and R² may be respectively the same or different, and are ahydrogen atom or an alkyl group. The alkyl group may be any of straightchain, branched or cyclic type. Carbon atoms of the alkyl group are notespecially limited, however, preferably 1 to 8, more preferably 1 to 4and further preferably 1. Specific examples of the alkyl group include amethyl group, an ethyl group, a propyl group, an isopropyl group, abutyl group, an isobutyl group, a sec-butyl group, a tert-butyl group, apentyl group, an isopentyl group, a neopentyl group, a hexyl group, aheptyl group, an octyl group, a nonyl group, a decyl group, acyclopropyl group, a cyclopentyl group and a cyclohexyl group. Alkylgroups other than these may also be used. And examples of a borazinecompound include borazine, N,N′,N″-trimethylborazine,N,N′,N″-triethylborazine, N,N′,N″-tri(n-propyl)borazine,N,N′,N″-tri(iso-propyl)borazine, N,N′,N″-tri(n-butyl)borazine,N,N′,N″-tri(sec-butyl)borazine, N,N′,N″-tri(iso-butyl)borazine,N,N′,N″-tri(tert-butyl)borazine, N,N′,N″-tri(1-methylbutyl)borazine,N,N′,N″-tri(2-methylbutyl)borazine, N,N′,N″-tri(neo-pentyl)borazine,N,N′,N″-tri(1,2-dimethylpropyl)borazine,N,N′,N″-tri(1-ethylpropyl)borazine, N,N′,N″-tri(n-hexyl)borazine,N,N′,N″-tricyclohexylborazine, N,N′-dimethyl-N″-ethylborazine,N,N′-diethyl-N″-methylborazine, N,N′-dimethyl-N″-propylborazine,B,B′,B″-trimethylborazine, B,B′,B″-triethylborazine,B,B′,B″-tri(n-propyl)borazine, B,B′,B″-tri(isopropyl)borazine,B,B′,B″-tri(n-butyl)borazine, B,B′,B″-tri(isobutyl)borazine,B,B′,B″-tri(tert-butyl)borazine, B,B′,B″-tri(1-methylbutyl)borazine,B,B′,B″-tri(2-methylbutyl)borazine, B,B′,B″-tri(neopentyl)borazine,B,B′,B″-tri(1,2-dimethylpropyl)borazine,B,B′,B″-tri(1-ethylpropyl)borazine, B,B′,B″-tri(n-hexyl)borazine,B,B′,B″-tricyclohexylborazine, B,B′-dimethyl-B″-ethylborazine,B,B′-diethyl-B″-methylborazine, and B,B′-dimethyl-B″-propylborazine. Inthis connection, when stability such as water resistance and a handlingproperty of a borazine compound produced are considered, a borazinecompound preferably is an N-alkylborazine.

Further, a borazine compound prepared may be an alkylborazine wherein anitrogen moiety and a boron moiety are substituted with an alkyl group(namely, both of R¹ and R² are an alkyl group) which includesB,B′,B″-trimethyl-N,N′,N″-trimethylborazine,B,B′,B″-trimethyl-N,N′,N″-triethylborazine, andB,B′,B″-triethyl-N,N′,N″-trimethylborazine.

A route for obtaining a borazine compound to be prepared is notespecially limited. When a commodity of a borazine compound iscommercially available, said commodity which is purchased may be used,or a borazine compound prepared personally may be used.

A method for preparing personally a borazine compound also is notespecially limited. One example of a method for preparing a borazinecompound represented by Chemical formula 1 described above includes amethod for reacting in a solvent an alkali boron hydride represented byABH₄ (wherein A is a lithium atom, a sodium atom, or a potassium atom)with an amine salt represented by (RNH₃)_(n)X (wherein R. is a hydrogenatom or an alkyl group, X is a sulfuric acid group or a halogen atom,and n is 1 or 2).

In an alkali boron hydride (ABH₄), A is a lithium atom, a sodium atom,or a potassium atom. Examples of an alkali boron hydride include sodiumboron hydride and lithium boron hydride.

In an amine salt represented by (RNH₃)_(n)X, R is a hydrogen atom or analkyl group, and X is a sulfuric acid group or a halogen atom. And whenX is a sulfuric acid group, n is 2, and when X is a halogen atom, nis 1. When n is 2, R may be the same or different as stated above.Considering yield of a synthesis reaction or easiness of handling, Rpreferably is the same alkyl group. The alkyl group may be any ofstraight chain, branched or cyclic type. Carbon atoms of the alkyl groupare not especially limited, however, preferably 1 to 8, more preferably1 to 4 and further preferably 1. Specific examples of the alkyl groupinclude a methyl group, an ethyl group, a propyl group, an isopropylgroup, a butyl group, an isobutyl group, a sec-butyl group, a tert-butylgroup, a pentyl group, an isopentyl group, a neopentyl group, a hexylgroup, a heptyl group, an octyl group, a nonyl group, a decyl group, acyclopropyl group, a cyclopentyl group, and a cyclohexyl group. Alkylgroups other than these may also be used. Examples of the amine saltinclude ammonium chloride (NH₄Cl), monomethylamine hydrochloride(CH₃NH₃Cl), monoethylamine hydrochloride (CH₃CH₂NH₃Cl), monomethylaminehydrobromide (CH₃NH₃Br), monoethylamine hydrofluoride (CH₃CH₂NH₃F),ammonium sulfate ((NH₄) ₂SO₄), and monomethylamine sulfate((CH₃NH₃)₂SO₄).

An alkali boron hydride and an amine salt used may be selected inaccordance with a structure of a borazine compound synthesized. Forexample, when N-methylborazine wherein a methyl group is bonded to anitrogen atom composing a borazine ring, is produced, as an amine salt,an amine salt wherein R is a methyl group such as monomethylaminehydrochloride, may be used.

A mixing ratio of an alkali boron hydride and an amine salt is notparticularly limited, but when an amount used of an amine salt issupposed to be 1 mol, an amount used of an alkali boron hydride ispreferably 1 to 1.5 mol.

A solvent for synthesis is not particularly limited, and for example,tetrahydrofuran, monoethylene glycol dimethyl ether (monoglyme),diethylene glycol dimethyl ether (diglyme), triethylene glycol dimethylether (triglyme) and tetraethylene glycol dimethyl ether (tetraglyme)are included.

A reaction condition of an alkali boron hydride and an amine salt is notparticularly limited. A reaction temperature is preferably 20 to 250°C., more preferably 50 to 240° C., further preferably 100 to 220° C.When a reaction is conducted in the range as described above, a contentof hydrogen generated is easily controlled. A reaction temperature canbe measured by using a sensor of temperature such as a K-thermocouple.

On the other hand, an alkylborazine compound can be synthesized bytaking a halogenated borazine compound such asB,B′,B″-trichloro-N,N′,N″-trialkylborazine as a starting material, andby substituting a chlorine atom of said compound with an alkyl groupusing a Grignard reagent (see D.T. HAWORTH and L.F. HOHNSTEDT, J. Am.Chem. Soc., 82, 3860 (1960)).

A borazine compound synthesized can be purified in accordance whenneeded. As a method for purification, for example, distillationpurification is used.

A scale and a type of distillation purification equipment maybedetermined in response to environment or a scale. For example, to treata large quantity of a borazine compound, an industrial scaledistillation column maybe used. On the other hand, to treat a smallquantity of a borazine compound, distillation purification using adistillation tube can be used. For example, as a specific example ofequipment for distillation to treat a small quantity of a borazinecompound, distillation equipment attached with a Liebig cooling tube bya Claisen type connecting tube to a 3-neck flask may be used. However, atechnical scope of the present invention is by no means limited topractical embodiments using these equipments for distillation.

Temperature on distillation purification is not particularly limited,and may be appropriately set in accordance with kinds of a borazinecompound synthesized. As one example, it is usually set at around 100 to150° C.

[A Filtration Step]

Successively, a borazine compound prepared in the above-described isfiltrated. Thereby, impurities can be separated and a borazine compoundis further purified, and production of a purified borazine compound iscompleted.

In a method of the present aspect, this filtration step is conducted inan atmospheric condition wherein a water content thereof is not higherthan a specified value.

Specifically, a water content in the above-described atmosphere is nothigher than 2000 volume ppm, preferably not higher than 1000 volume ppm,more preferably not higher than 500 volume ppm, further preferably nothigher than 100 volume ppm, particularly preferably not higher than 10volume ppm, most preferably not higher than 1 volume ppm. As statedabove, a borazine compound is weak to water, and when a water content inan atmosphere is much, there is fear that a borazine compound decomposesby contacting with water, and impurities are contaminated into aborazine compound. Therefore, according to the present invention,decomposition of a borazine compound by contacting with water issuppressed, and efficiency of purification of a borazine compound can beimproved. In this connection, as a method of making a water content inan atmosphere to not higher than 2000 volume ppm, for example, a methodof displacing with a gas of which a dew point is controlled, can beused. Incidentally, as a value of water content in an atmosphereconducted at a filtration step, a value measured by a method adopted inExamples as stated later is adopted.

Further, in the present invention, cleanliness in an atmosphere alsopreferably is controlled to not higher than a specified value.

Here, “cleanliness” means a number of a foreign material having a sizeof not smaller than 0.1 μm residing in 1 cubic feet (1 ft³). In themethod described above according to the present invention, thefiltration step is conducted in an atmosphere wherein a number of aforeign material having a size of not smaller than 0.1 μm residing in 1ft³ is preferably not higher than 1000, more preferably not higher than100, and further preferably not higher than 10, and particularlypreferably not higher than 1. Herein, as a method of making cleanlinessin an atmosphere to not higher than 1000, for example, a method of airfiltration with a filter can be used. Incidentally, as a value ofcleanliness in an atmosphere conducted at a filtration step, a valuemeasured by a method adopted in Examples as stated later is adopted.

Other specific embodiments of an atmosphere conducted at a filtrationstep are not especially limited, but the filtration step preferably isconducted under an atmosphere of a rare gas such as argon or an inactivegas such as nitrogen.

Specific embodiments of filtration means used to obtain a purifiedborazine compound conducted at a filtration step are not especiallylimited. One example thereof includes an embodiment wherein a borazinecompound is purified with a filtration filter. In this case, a meshopening size of a filtration filter is not especially limited, andpreferably is 0.01 to 1 μm, and more preferably 0.1 to 0.5 μm. When amesh opening size of a filtration filter is too small, there is fearthat clogging is soon caused, and the filtration step does not smoothlyproceed. On the other hand, when a mesh opening size of a filtrationfilter is too large, there is fear that impurities in a compound are notsufficiently removed. Furthermore, a constituent material of afiltration filter also is not especially limited, but from the viewpointof enabling to sufficiently suppress contamination of impurities, thefiltration filter preferably is composed of a resin. A resin materialcomposing the filtration filter includes, for example, apolytetrafluoroethylene (PTFE), a polypropylene, and the like. Amongthem, from the viewpoint of effectively suppressing contamination oforganic impurities, PTFE is preferably used as a constituent material ofthe filtration filter.

A flow velocity of a borazine compound on filtrating by passing througha filtration filter also is not especially limited. However, it ispreferably 0.01 to 1000 cm³/sec, more preferably 1 to 100 cm³/sec. Whenthe flow velocity is too small, a period of filtration becomes longer,and therefore there is fear that production cost is increased. On thecontrary, when the flow velocity is too large, there is fear thatcontamination of impurities cannot be sufficiently suppressed.

Another aspect according to the present invention relates to a techniquefor suppressing contamination of impurities on filling a borazinecompound into a container. Specifically, said aspect is a method forfilling a borazine compound, which has a filling step wherein a borazinecompound is filled into a container under an atmospheric condition of awater content of not higher than 2000 volume ppm.

In a filling method according to the present aspect, a borazine compoundis filled into a container under an atmosphere having specified watercontent. Thereby, contamination of impurities on filling of a borazinecompound can effectively be suppressed.

Subsequently, the filling method according to the present aspect isexplained in the order of processes.

[A Borazine Compound Preparatory Step]

First of all, a borazine compound desired to fill is prepared. Aspecific embodiment for preparing a borazine compound, and a specificembodiment of a borazine compound thereby prepared can be adopted in thesame way as the embodiments explained in the column of [A borazinecompound preparatory step] of a production method in the above statedembodiments, and therefore herein details thereof is omitted.

In the present step, preferably, a purified borazine compound producedby a production method, which has the above stated embodiment, isprepared. By using this purified borazine compound, an amount ofimpurities in a borazine compound filled can be further decreased.

[Filling Step]

Subsequently, a borazine compound prepared in the above described isfilled into a container. In a filling method according to the presentaspect, this filling step is conducted under an atmospheric condition ofa water content of not higher than 2000 volume ppm. Another specificpreferable embodiment of an atmosphere conducted in filling step can beadopted in the same way as the embodiment explained in the column of[Filtration step] of a production method in the above statedembodiments, and therefore details thereof are omitted.

In a filling step, a specific embodiment of a container wherein aborazine compound is filled, also is not especially limited. As for amaterial composing a container, for example, a metallic material such asstainless steel and hastelloy, a plastic material such as PTFE, and thelike can be adopted. Among them, a container is preferably composed ofstainless steel from the viewpoint that a sealing property thereof isexcellent. From the viewpoint of more effectively suppressingcontamination of impurities, a container is preferably possible to besealed, and a means to make a container possible to be sealed isexemplified by an embodiment wherein a portion of a container isprovided with a valve, for instance.

In a filling step, a specific embodiment of a filling means which isused to fill a borazine compound is not especially limited. As oneexample thereof, an embodiment wherein a borazine compound is filled bypressure transferring a borazine compound from a tank wherein a borazinecompound is conserved, can be exemplified. In this case, a filling rateon filling a borazine compound to a container is not especially limited.However, it is preferably 0.1 to 100 cm³/sec, more preferably 1 to 10cm³/sec. When the filling rate is too small, a period of filling becomeslonger, and therefore there is fear that production cost is increased.On the other hand, when the filling rate is too large, there is fearthat exchange of a container for filling becomes difficult.

According to a production method or a filling method of the presentinvention, a purified borazine compound wherein a contaminated amount ofimpurities is reduced than conventional can be provided. Namely, thepresent invention provides also a purified borazine compound wherein acontent of impurities is reduced. In this case, a content of impuritiesin a purified borazine compound provided by the present invention is nothigher than 100 particles/mL, preferably not higher than 50particles/mL, and further preferably not higher than 10 particles/mL.Herein, “impurities” mean a foreign matter (a substance foreign to aborazine compound) having a particle diameter of not smaller than 0.5μm. In this connection, it is not saying that the less a content ofimpurities in a purified borazine compound obtained is, the morepreferable. However, a technical scope of a production method of theabove stated embodiment according to the present invention is by nomeans limited to an embodiment wherein a purified borazine compoundcontaining such an amount of impurities is produced. Depending on cases,a purified borazine compound containing impurities outside of this rangemay be produced. Furthermore, a technical scope of a purified borazinecompound containing such a small amount of impurities is by no meanslimited to a purified borazine compound produced by a production methodof the above stated embodiment according to the present invention, anddepending on cases, it may be what has been produced by another method.Incidentally, as a content of impurities in a purified borazine compoundproduced, a value measured by a method described in Examples as statedlater is adopted.

According to a further another embodiment of the present invention, acontainer for preserving a borazine compound, which has withstandingpressure of not lower than 0.1 MPa, is provided. By preserving aborazine compound in such a container, flowing of outer air containingmoisture into a container for preservation can be suppressed onpreserving a borazine compound, and therefore decomposition of aborazine compound in preservation can be effectively suppressed.

In this connection, “preservation” of a borazine compound is a conceptwhich includes anytime of, from the time when a borazine compound wasfilled into a container for preservation after synthesis of saidcompound, to the time when it is used for a specified usage. Therefore,for instance, not only the case where a borazine compound is preservedin a store house in a state of being filled in a container, but also thecase where it is transported by a truck or the like in accordance withshipping, are included in the concept of “preservation” according to thepresent invention. Moreover, a borazine compound may be preserved alonein a container for preservation, but depending on cases, it maybepreserved in a container for preservation in a state of being dissolvedin a proper solvent, or the like.

Withstanding pressure of a container for preservation according to thepresent embodiment is not lower than 0.1 MPa as stated above, preferablynot lower than 0.2 MPa, and further preferably not lower than 0.3 MPa.In this connection, when the withstanding pressure of a container forpreservation is lower than 0.1 MPa, there is fear that on preserving aborazine compound, an atmosphere flows into an inner side of acontainer, and a borazine compound decomposes owing to contact withmoisture contained in the atmosphere. In addition, as a value ofwithstanding pressure of a container for preserving a borazine compound,a value measured by a method adopted in Examples as stated later isadopted.

“Withstanding pressure” means, when a closed container is put in anatmosphere having a predetermined initial pressure (supposed 0.1 MPa inthe present invention) and then pressure of said atmosphere is elevated,pressure which is reduced an initial pressure (0.1 MPa) from pressure ofan atmosphere at the point when said atmosphere can flow into an innerside of said container. That means, when pressure of an atmosphereexceeds “withstanding pressure +an initial pressure (0.1 MPa)”, saidatmosphere may flow into an inner side of a container. Therefore, in thepresent invention, when a borazine compound is preserved in anatmosphere wherein an initial pressure is 0.1 MPa (approximately equalsto an atmospheric pressure), a borazine compound results to be preservedin a container into which said atmosphere does not flow even whenpressure of an atmosphere becomes not lower than 0.2 MPa.

Here, from the viewpoint of prevention of flowing of an atmosphere forpreservation into an inner side of a container for preservation, anupper limit value of withstanding pressure of a container forpreservation is not limited. However, from the viewpoint of easiness ofhandling such as weight of a container, the withstanding pressure of acontainer for preservation is preferably not higher than 2.0 MPa, andmore preferably not higher than 0.5 MPa. However, embodiments outside ofthese ranges can be adopted.

Specific embodiments of a size, a material, or the like of a containerfor preservation are not especially limited. A small container forpreservation may be used for preserving a small amount of a borazinecompound, which was synthesized for a laboratory level. And a largecontainer for preservation may be used for preserving a large amount ofa borazine compound, which was synthesized for an industrial level.

As for a material of a container for preservation, for example, ametallic material such as stainless steel and hastelloy, a plasticmaterial such as a polytetrafluoroethylene (PTFE), and the like can beadopted. Among them, a container is preferably composed of stainlesssteel, from the viewpoint that withstanding pressure thereof is high.And, for the object of further improving corrosion resistance of acontainer for preservation, an inner side of the container composed ofthe above described materials such as a metal should be coated with aresin. In this case, a resin used for coating is not especially limited,and for example, it includes a polytetrafluoroethylene (PTFE), apolypropylene, and the like. Among them, it is preferable to conductcoating with PTFE from the viewpoint that improving effect of corrosionresistance thereof is excellent. Herein, a thickness of coating in resincoating is not especially limited, and is preferably 10 to 3000 μm, morepreferably 500 to 1000 μm.

Further, a container for preservation is preferably possible to besealed, and a means to make a container possible to be sealed isexemplified by an embodiment wherein a portion of a container isprovided with a valve, for instance.

In this connection, a temperature condition for preservation onpreserving a borazine compound with a container for preservationaccording to the present aspect cannot be unambiguously defined, sincethe stability to temperature varies depending on kinds of a borazinecompound stability thereof, and therefore temperature conditionssuitable for maintaining desirable purity can appropriately be chosen.However, a borazine compound is usually preserved under a temperaturecondition of preferably not higher than 30° C., and more preferably nothigher than 25° C. When a temperature condition on preserving a borazinecompound exceeds 30° C., there is fear that impurities in a borazinecompound are increased. Especially when an R₂ group in theabove-described Chemical formula 1 is a hydrogen atom or a lower alkylhaving a carbon number of 1 to 2, this problem is apt to be remarkablyexhibited. In the above stated embodiment, a temperature condition onpreservation of not higher than 30° C. most preferably extends the wholeperiod from the beginning to the end of preservation, but it is notlimited to only such an embodiment, and at least one point in the periodfrom the beginning to the end of preservation, preferably in not shorterthan 80% of the above described period, and more preferably in notshorter than 90% of the above described period, a temperature conditionon preservation of not higher than 30° C. should be kept.

According to a container for preservation and a method for preservationusing it of the present aspects, decomposition of a borazine compound onpreservation can be suppressed, and decrease of purity of a borazinecompound can be prevented to an extremely low extent. Namely, thepresent invention also provides a borazine compound wherein decrease ofpurity is suppressed. In this case, decrease of purity of a borazinecompound provided by the present invention in case of preserving at 25°C. for 60 days is preferably not higher than 1% by mass, more preferablynot higher than 0.1% by mass, and further preferably not higher than0.01% by mass. Incidentally, “decrease of purity of a borazine compoundis 1% by mass” means that purity of a borazine compound after preservingat 25° C. for 60 days is 98.8% by mass, for instance, in case wherepurity of a borazine compound at the beginning of preservation is 99.8%by mass. That means, “decrease of purity” does not mean a relative valuebefore and after preservation, but means decrease of absolute purity ofa borazine compound. Incidentally, as a value of purity of a borazinecompound, a value measured by a method adopted in Examples as statedlater is adopted.

Use of a borazine compound is not especially limited, but the compoundcan be used to forma low dielectric constant film such as an interlayerdielectric film for semiconductor, a barrier metal layer and an etchstopper layer. In such case, a borazine compound may be used or acompound derived from a borazine compound by modification may be used. Apolymer obtained by polymerizing a borazine compound or a borazinecompound derivative may be used as a raw material for an interlayerdielectric film for semiconductor, a barrier metal layer or an etchstopper layer.

A polymer can be formed with a compound having a borazine ring skeletonas a monomer. Polymerization method and polymerization mode are notespecially limited. Polymerization method is selected depending on afunctional group bonded to a borazine ring. For example, when an aminogroup is bonded, a polymer can be synthesized by condensationpolymerization. When a vinyl group or a functional group containing avinyl group is bonded to a borazine ring, a polymer can be formed byradical polymerization using a polymerization initiator. A polymer maybe a homopolymer, or a copolymer containing two or more monomer units.Type of copolymer may be any of a random copolymer, a block copolymer, agraft copolymer, and the like. By using a monomer having three or morefunctional groups which can forma bond with other monomer, a polymer inwhich monomers are bonded together like a network can be obtained.

Next, a method for forming an interlayer dielectric film forsemiconductor, a barrier metal layer or an etch stopper layer will beexplained. In this connection, in the following description, “a borazinecompound”, “a borazine compound derivative” and “a polymer originatedwith them” are referred to as “a borazine-ring-containing compound”.

To form an interlayer dielectric film for semiconductor, a barrier metallayer or an etch stopper layer using a borazine-ring-containingcompound, a technique to form a coating film by preparing a compositionin a solution state or a slurry state containing theborazine-ring-containing compound, and coating this composition. Asolvent used in such a case for dissolving or dispersing theborazine-ring-containing compound is not especially limited as long asthe solvent can dissolve or disperse the borazine-ring-containingcompound or other component to be added, if necessary. As the solvent,for example, alcohols such as ethylene glycol and ethylene glycolmonomerthyl ether; aromatic hydrocarbons such as toluene, benzene andxylene; hydrocarbons such as hexane, heptane and octane;tetrahydrofurane; diglyme; and tetraglyme, are used. These solvents maybe used alone or in combination of two or more kinds. When filmformation is performed using spin coating, diglyme is preferably used.By using diglyme or a derivative thereof as a solvent, a uniformity of afilm to be produced is improved, and clouding of a film can beprevented. An amount of a solvent to be used for dissolving ordispersing the borazine-ring-containing compound is not especiallylimited, and may be determined corresponding to a production means forproducing a low dielectric constant material. For example, when filmformation is performed using spin coating, a kind and an amount of asolvent may be determined so that a viscosity becomes suitable for spincoating.

A composition containing the borazine-ring-containing compound isprovided to a desired site, dried and solidified. For example, to forman interlayer dielectric film for semiconductor, the composition may becoated on a substrate by spin coating, and dried. When a film having adesired thickness cannot be obtained in one coating and drying, coatingand drying may be repeated until a desired thickness is obtained. Filmforming conditions such as number of revolutions of spin coater, dryingtemperature and drying time are not especially limited.

Coating on a substrate may be performed using a technique other than thespin coating. For example, spray coating and dip coating can be used.

After that, a coating film is dried. Drying temperature of a coatingfilm is usually around 100 to 250° C. The “drying temperature” heremeans the highest temperature while drying treatment is carried out. Forexample, when a drying temperature is raised slowly, maintained at 100°C. for 30 min., and followed by cooling, a drying temperature is 100° C.Drying temperature can be measured using a thermo couple. Drying timefor coating film is not especially limited, but may be determined, asappropriate, in consideration of characteristics such as dielectricconstant and moisture resistance of a low dielectric constant materialto be obtained.

EXAMPLES

Hereafter, embodiments of conducting the present invention are explainedin detail by using Examples and Comparative Example, but technical scopeof the present invention is not limited to the embodiments describedbelow.

Example 1-1

Into a reaction vessel equipped with a cooler, while purging withnitrogen, methylamine hydrochloride (33.5 g) of an amine salt which wasdehydration treated, and triglyme (98.6 g) which is a solvent werecharged, and temperature of a reaction system was raised to 100° C.

On the other hand, sodium borohydride (21.0 g) which is an alkali boronhydride is prepared, this was added to triglyme (88.7 g) separatelyprepared, and thus a slurry was prepared.

The slurry of sodium borohydride prepared in the above described wasadded slowly over one hour to the reaction vessel which was raised to100° C. as described above

After the completion of the addition of slurry, reaction system wasraised to 200° C. over 2 hours , and further was matured at 200° C. for2 hours, to synthesize N,N′,N″ -trimethylborazine.

N,N′,N″-trimethylborazine obtained was distilled at 150 to 220° C., topurify N,N′,N″-trimethylborazine.

The N,N′,N″-trimethylborazine purified was, under a nitrogen atmosphereat 23° C., cleanliness of 500 and a water content of 127 volume ppm.,filtrated with a 0.1 μm filtration filter made of apolytetrafluoroethylene (PTFE) to further purifyN,N′,N″-trimethylborazine. In this connection, cleanliness of anatmosphere was measured with a particle counter (KC-03A1 manufactured byRION Co., Ltd.), and a water content was measured with an online dewpoint meter (manufactured by Nagano Electric Industial Co., Ltd.) (samein Examples hereinafter). Further, N,N′,N″-trimethylborazine filtratedwas filled into a container made of stainless steel which is possible toseal with a valve.

When a number of impurities having a particle diameter of not smallerthan 0.5 μm contained in the purified N,N′,N″-trimethylborazine filledinto the container was measured with a particle counter (LIQUILAZ-502-HF manufactured by Particle Measuring Systems Inc. (PMS Inc.)), aresult thereof was 46 particles/mL. Further, when purity of the purifiedN,N′,N″-trimethylborazine filled was measured, a result was 99.9% bymass. Incidentally, purity of a borazine compound was measured by gaschromatography. Measuring conditions were as follows.

Equipment: GC-14B manufactured by Shimadzu Corporation;

Column: Ultra Alloy (8H) manufactured by Hitachi Science Systems Ltd.;

Carrier gas: nitrogen;

Flow rate of carrier gas: 3.0 mL/min;

Sample injection temperature: 300° C.;

Detector temperature: 300° C.;

Sample injection amount: 0.2 μL; and

Column temperature: 50° C. (5 min)→raise temperature to 250° C. at araising rate of 20° C./min→raise temperature to 300° C. at a raisingrate of 10° C./min→300° C. (10 min).

Example 1-2

In the similar method to that of Example 1-1 described above,N,N′,N″-trimethylborazine was synthesized, and was purified bydistillation.

The N,N′,N″-trimethylborazine purified was, under a nitrogen atmosphereat 23° C., cleanliness of 10, and a water content of 1 volume ppm.,filtrated with a 0.1 μm filtration filter made of PTFE to further purifyN,N′,N″-trimethylborazine. Further, N,N′,N″-trimethylborazine filtratedwas filled into a container made of stainless steel which is possible toseal with a valve.

When a number of impurities having a particle diameter of not smallerthan 0.5 μm contained in the purified N,N′,N″-trimethylborazine filledinto the container was measured with a particle counter (LIQUILAZ-S02-HF manufactured by PMS Inc.), a result thereof was not more than10 particles/mL. Further, when purity of the purifiedN,N′,N″-trimethylborazine filled was measured, a result was 99.9% bymass.

Example 1-3

In the similar method to that of Example 1-1 described above,N,N′,N″-trimethylborazine was synthesized, and was purified bydistillation.

The N,N′,N″-trimethylborazine purified was, under a nitrogen atmosphereat 23° C., cleanliness of 50000, and a water content of 127 volume ppm., filtrated with a 0.1 μm filtration filter made of PTFE to furtherpurify N,N′,N″-trimethylborazine. Further, N,N′,N″-trimethylborazinefiltrated was filled into a container made of stainless steel which ispossible to seal with a valve.

When a number of impurities having a particle diameter of not smallerthan 0.5 μm contained in the purified N,N′,N″-trimethylborazine filledinto the container was measured with a particle counter (LIQUILAZ-S02-HF manufactured by PMS Inc.), a result thereof was not more than73 particles/mL. Further, when purity of the purifiedN,N′,N″-trimethylborazine filled was measured, a result was 99.8% bymass.

Comparative Example 1

In the similar method to that of Example 1-1 described above,N,N′,N″-trimethylborazine was synthesized, and was purified bydistillation.

The N,N′,N″-trimethylborazine purified was, under a nitrogen atmosphereat 23° C., cleanliness of 50000, and a water content of 2570 volumeppm., filtrated with a 0.1 μm filtration filter made of PTFE to furtherpurify N,N′,N″-trimethylborazine. Further, N,N′,N″-trimethylborazinefiltrated was filled into a container made of stainless steel which ispossible to seal with a valve.

When a number of impurities having a particle diameter of not smallerthan 0.5 μm contained in the purified N,N′,N″-trimethylborazine filledinto the container was measured with a particle counter (LIQUILAZ-S02-HF manufactured by PMS Inc.), a result thereof was not less than3000 /mL. Further, when purity of the purified N,N′,N″-trimethylborazinefilled was measured, a result was 97.5% by mass.

From the results shown in Example 1-1 to Example 1-3 and ComparativeExample 1, it is shown that contamination of impurities into a borazinecompound is effectively suppressed by filtrating and purifying aborazine compound under a specified atmospheric condition of watercontent or by filling it into a container under a specified atmosphericcondition of water content.

Therefore, according to one aspect of the present invention, furthermoreimprovement of quality in uses wherein a borazine compound is used (forexample, an interlayer dielectric film for semiconductor), is purposedfor.

Example 2-1

Into a reaction vessel equipped with a cooler, while purging withnitrogen, methylamine hydrochloride (33.5 g) of an amine salt which wasdehydration treated, and triglyme (98.6 g) which is a solvent werecharged, and temperature of a reaction system was raised to 100° C.

On the other hand, sodium borohydride (21.0 g) which is an alkali boronhydride is prepared, this was added to triglyme (88.7 g) separatelyprepared, and thus a slurry was prepared.

The slurry of sodium borohydride prepared in the above described wasadded slowly over one hour to the reaction vessel which was raised to100° C. as described above.

After the completion of the addition of slurry, a reaction system wasraised to 200° C. over 2 hours , and further was matured at 200° C. for2 hours, to synthesize N, N′,N″-trimethylborazine.

N,N′,N″-trimethylborazine obtained was distilled at 150 to 220° C., topurify N,N′,N″-trimethylborazine. When purity of the purifiedN,N′,N″-trimethylborazine obtained was measured, a result was 99.8% bymass. Incidentally, purity of a borazine compound was measured by gaschromatography. Measuring conditions are the same as those of Example1-1.

As a container for preserving a borazine compound, a container ofstainless steel the inner side of which was coated with PTFE (athickness of the coating: 500 μm), was prepared. When withstandingpressure of a container for preservation prepared was measured, it was0.2 MPa. In this case, measurement of withstanding pressure of acontainer for preservation was conducted as follows. Said container wasprovided with a leak valve, and a nitrogen gas was filled into saidcontainer at 23° C., and a filling pressure when a nitrogen gas beginsto leak from said container through the leak valve, was measured byusing a pressure gauge. Then, it was calculated by reducing a pressureof an atmosphere from the measured value.

The purified N,N′,N″-trimethylborazine obtained as described above wasfilled into a container for preservation prepared and was sealed, andpreserved at 25° C. for 60 days in a state of being pressurized by 0.1MPa with a nitrogen gas. When purity of N,N′,N″-trimethylborazine afterthe preservation was measured, it was 99.8% by mass, and thus decreaseof purity of the borazine compound was not observed.

Example 2-2

Into a reaction vessel equipped with a cooler,B,B′,B″-trichloro-N,N′,N″-trimethylborazine (41.2 g) which is ahalogenated borazine compound and diethyl ether (80 g) as a solvent werecharged, and a diethyl ether solution of ethylmagnesium bromide (3 M,200 mL) was added drop by drop at 20° C. over 3 hours. Subsequently,after being matured under a refluxing condition for 2 hours, a reactionsolution was cooled to room temperature, and impurities were filtratedout by filtration.

Diethyl ether was distilled off from the filtrate obtained by filtrationas described above, further filtration was conducted, and the filtratewas distilled at a reduced pressure to purify B,B′,B″-triethyl-N,N′,N″-trimethylborazine. When purity ofB,B′,B″-triethyl-N,N′,N″-trimethylborazine obtained was measured in thesame method as Example 1-1 described above, it was 99.5% by mass.

The purified B,B′,B″-triethyl-N,N′,N″-trimethylborazine obtained asdescribed above was filled into the same container for preservation asthat of Example 2-1 described above and was sealed, and preserved at 25°C. for 60 days in a state of being pressurized by 0.1 MPa with anitrogen gas. When purity of B,B′,B″-triethyl-N,N′,N″-trimethylborazineafter the preservation was measured, it was 99.5% by mass, and thusdecrease of purity of the borazine compound was not observed.

Example 2-3

In the same method as Example 2-2 described above except that atemperature condition on preservation was set at 60° C.,B,B′,B″-triethyl-N,N′,N″-trimethylborazine was synthesized, purified,and preserved. When purity of B,B′,B″-triethyl-N,N′,N″-trimethylborazineafter the preservation was measured, it was 98.8% by mass, and thusdecrease of purity of the borazine compound by 0.7% by mass wasobserved.

Comparative Example 2

In the same method as Example 2-1 described above,N,N′,N″-trimethylborazine was synthesized, and purified by distillation.

As a container for preserving a borazine compound, a container ofstainless steel the inner side of which was coated with PTFE (athickness of the coating: 500μm), was prepared. When withstandingpressure of a container for preservation prepared was measured, it was0.05 MPa.

The purified N,N′,N″-trimethylborazine obtained as described above wasfilled into a container for preservation prepared and was sealed, andpreserved at 35° C. for 60 days. When purity ofN,N′,N″-trimethylborazine after the preservation was measured, it was95.1% by mass, and thus decrease of purity of the borazine compound by4.7% by mass was observed.

From the results shown in Examples 2-1 to 2-3, and Comparative Example 2stated above, by preserving a borazine compound in a container forpreservation having a specified withstanding pressure, it is shown thatdecomposition of a borazine compound can effectively be suppressed.Further, by conducting the preservation under a specified temperaturecondition, it is shown that decrease in purity of a borazine compoundcan effectively be suppressed.

Therefore, according to another aspect of the present invention,furthermore improvement of quality in uses wherein a borazine compoundis used (for example, an interlayer dielectric film for semiconductor),is aimed for.

The present application is based on Japanese Patent Application No.2005-241389 filed on Aug. 23, 2005 and Japanese Patent Application No.2005-250074 filed on Aug. 30, 2005, and the disclosures are incorporatedherein by reference in entirety.

What is claimed is:
 1. A method for filling a borazine compound, whichhas a filling step wherein a borazine compound is filled into acontainer under an atmospheric condition of a water content of nothigher than 2000 volume ppm.
 2. A method for filling according to claim1, wherein the filling step is conducted under an atmospheric conditionof cleanliness of not higher than
 1000. 3. A method for fillingaccording to claim 1, wherein the borazine compound is a purifiedborazine compound produced by a production method including a filtrationstep wherein the borazine compound to be prepared is filtered under anatmospheric condition of a water content of not higher than 2000 volumeppm.
 4. A method for filling according to claim 2, wherein the borazinecompound is a purified borazine compound produced by a production methodincluding a filtration step wherein the borazine compound to be preparedis filtered under an atmospheric condition of a water content of nothigher than 2000 volume ppm.
 5. A method for filling according to claim1, wherein a number of impurities having a particle diameter of notsmaller than 0.5 .mu.m, which are contained in the borazine compoundproduced, is not higher than 100 particles/mL.
 6. A method for fillingaccording to claim 2, wherein the borazine compound is a purifiedborazine compound produced by a production method including a filtrationstep wherein the borazine compound to be prepared is filtered under anatmospheric condition of a water content of not higher than 2000 volumeppm.
 7. A method for filling according to claim 2, wherein a number ofimpurities having a particle diameter of not smaller than 0.5 .mu.m,which are contained in the borazine compound produced, is not higherthan 100 particles/mL.
 8. A method for filling according to claim 3,wherein a number of impurities having a particle diameter of not smallerthan 0.5 .mu.m, which are contained in the borazine compound produced,is not higher than 100 particles/mL.
 9. A method for filling accordingto claim 4, wherein a number of impurities having a particle diameter ofnot smaller than 0.5 .mu.m, which are contained in the borazine compoundproduced, is not higher than 100 particles/mL
 10. A method for fillingaccording to claim 6, wherein a number of impurities having a particlediameter of not smaller than 0.5 .mu.m, which are contained in theborazine compound produced, is not higher than 100 particles/mL.
 11. Amethod for filling according to claim 3, wherein the filtration step isconducted under an atmospheric condition of cleanliness of not higherthan
 1000. 12. A method for filling according to claim 4, wherein thefiltration step is conducted under an atmospheric condition ofcleanliness of not higher than
 1000. 13. A method for filling accordingto claim 6, wherein the filtration step is conducted under anatmospheric condition of cleanliness of not higher than 1000.